Film Thickness Measurement

The system utilises a modern small spot spectroscopic reflectometer built on a simple-to-use tabletop platform. Incorporating core technology acquired from market leader Nanometrics, this system is specifically designed for a wide variety of R&D applications. The reliable solid state linear diode array provides fast, precise measurements of single-layer films such as oxide, nitride and photo-resist, as well as the top layer on film stacks of up to 3 layers in the thickness range of 100Å to 30µm. An outstanding value, complete with up to 15 standard film thickness measurement algorithms, this rugged and accurate system is used in laboratories worldwide to provide precision film thickness measurements in a compact design.

Applications

The system is designed to provide accurate film thickness measurements within a vast array of applications.

Guaranteed 3 layer measurement and in some cases beyond 3 depending on parameters.  Measures most smooth or semi-smooth surfaces with some reflectance

• LED

• Solar

• FPD/LCD

• OLED

• Photomask

• Power Device

• SOI

• Magnetic head for HDD

Film Thickness Range

• Standard Configuration (5x): 100 Å – 30 µm

• Thick Film Configuration (5x): 100 Å – 70 µm

Film thickness range assumes oxide on silicon. Ranges for other films may vary