• KDC 10
– smallest and most cost effective
– can be configured for in-situ preclean, ion beam sputter deposition, and ion beam etching.
• KDC 40
– small and cost effective
– can perform in-situ preclean, ion beam surface modification, ion beam assisted deposition, ion beam sputter deposition, ion beam etching and direct deposition.
– typical ion energy range is from 100 to 1200eV, while the ion current can exceed 120mA.
• KDC 75
– compact gridded ion source product.
– two filament cathodes which extends the time before maintenance.
– physical compactness and deep dished grids(essential when a tight installation presents short distances between the KDC 75 and a sputter target)
– ion energy range is from 100 to 1200eV, while the ion current can exceed 250mA.
• KDC 100
– middle sized DC gridded ion source product.
– For high volume production of thin metal multilayer structures by ion beam sputter deposition.
– dual filament cathode set-up and self-aligned grids
– ion energy range is from 100 to 1200eV, while the ion current can exceed 400mA.
• KDC 160
– largest and most powerful of our DC gridded ion source products.
– high power beam is realized without the need to water cool the ion source.
– ion energy range is from 100 to 1200eV, while the ion current can exceed 800mA.