• KDC 10

– smallest and most cost effective

– can be configured for in-situ preclean, ion beam sputter deposition, and ion beam etching.

• KDC 40

– small and cost effective

– can perform in-situ preclean, ion beam surface modification, ion beam assisted deposition, ion beam sputter deposition, ion beam etching and direct deposition.

– typical ion energy range is from 100 to 1200eV, while the ion current can exceed 120mA.

• KDC 75

– compact gridded ion source product.

– two filament cathodes which extends the time before maintenance.

– physical compactness and deep dished grids(essential when a tight installation presents short distances between the KDC 75 and a sputter target)

– ion energy range is from 100 to 1200eV, while the ion current can exceed 250mA.

• KDC 100

– middle sized DC gridded ion source product.

– For high volume production of thin metal multilayer structures by ion beam sputter deposition.

– dual filament cathode set-up and self-aligned grids

– ion energy range is from 100 to 1200eV, while the ion current can exceed 400mA.

• KDC 160

– largest and most powerful of our DC gridded ion source products.

– high power beam is realized without the need to water cool the ion source.

– ion energy range is from 100 to 1200eV, while the ion current can exceed 800mA.