•RFICP 40
– smallest and most cost effective RF gridded ion source product.
– ion energy range is from 100 to 1200eV, while the ion current can exceed 120mA.
• RFICP 100
– compact gridded ion source product which is well suited for ion beam sputter deposition and ion beam etching.
– ion energy range is from 100 to 1200eV, while the ion current can exceed 400mA.
• RFICP 140
– rugged gridded ion source product
– ion energy range is from 100 to 1200eV, while the ion current can exceed 600mA.
• RFICP 220
– powerful gridded ion source product
– ion energy range is from 100 to 1200eV, while the ion current can exceed 800mA.