•RFICP 40

– smallest and most cost effective RF gridded ion source product.

– ion energy range is from 100 to 1200eV, while the ion current can exceed 120mA.

• RFICP 100

– compact gridded ion source product which is well suited for ion beam sputter deposition and ion beam etching.

– ion energy range is from 100 to 1200eV, while the ion current can exceed 400mA.

• RFICP 140

– rugged gridded ion source product

– ion energy range is from 100 to 1200eV, while the ion current can exceed 600mA.

• RFICP 220

– powerful gridded ion source product

– ion energy range is from 100 to 1200eV, while the ion current can exceed 800mA.