Carrier concentration, doping and Epi structure analysis

ECVPro+

• Electrochemical Capacitance-Voltage Profiling.

• Carrier Concentration Profiling for Complex Epitaxial Structures. 

Applications

ECVPro+ introduces the first ever in-situ camera for unprecedented levels of control, ECVision™. allowing real-time imaging of the semiconductor/ electrolyte interface. Now you can see exactly what occurs at the sample surface during a measurement. For III-Nitrides, the ECVPro+ UV option extends the performance of the system for optimal profiling of GaN, InGaN and AlGaN.

Hg Probe Alternative: The ECVPro+’s accuracy and reproducibility provide a viable, safe and environmentally friendly alternative to the Mercury probe. ECVPro+ uses no Calomel reference electrode and is entirely Mercury free. The horizontal stage makes monitoring spatial distribution across a wafer simple and convenient. Using the depletion profile mode and the ultra-repeatable contacting area, ECVPro+ can accurately measure the surface doping variations across a wafer.

Alternative to Hall: ECVPro+ offers many advantages over Hall measurements. These include measurement of electrically activated dopants and individual structural layer information. Additionally, the ECVPro+ can be applied to a wide range of materials and structures and is not limited to profiling only on Si or suitable PN structures.

Features

• Eliminate Operator Variability. 

• Operator training time is reduced. 

• Sample preparation is simplified and the intuitive software leads the operator through the measurement process step by step reducing the possibility of errors. 

• Recipe-driven operation means no operator involvement when profiling complex structures.

• The novel design extends the sealing ring lifetime and eliminates the cost of expensive Calomel electrodes. 

• Signal electrodes and contact sets need less frequent replacement.

• The floor standing designs reduces footprint by approximately a factor of two compared with other profilers. 

• As the electrolyte and waste are contained on the unit, there is no need for an adjacent wet-bench.