Single Wafer Spin Processor
Single substrate spin processing is widely used in the semiconductor industry, where spin coating can be used to create thin films of less than 10nm thickness, Also cleaning and etching.
What we offer?
Less space occupying System(Table Top)
High Spin Speed and Acceleration
High Chemical compatibility
Bi Directional Movement with puddle
Touch screen display
Freedom to store unlimited recipe.
Structured and password protected recipe storage for easy and safe management
Suitable for : -
Applications for up to 6", 8" and 12" substrates : -
Spin Coater Drying
Rinse / Cleaning / Spin Etching
Manual & Automatic coating
Spin Coater Developing
Spin Coater with MegPie