Single Wafer Spin Processor

Single substrate spin processing is widely used in the semiconductor industry, where spin coating can be used to create thin films of less than 10nm thickness, Also cleaning and etching.

What we offer?

  • Affordable Price
  • Less space occupying System(Table Top)
  • High Spin Speed and Acceleration
  • High Chemical compatibility
  • Bi Directional Movement with puddle
  • Touch screen display
  • Freedom to store unlimited recipe.
  • Structured and password protected recipe storage for easy and safe management

Suitable for : -

  • R&D
  • University
  • Production
  • Biological Labs

Applications for up to 6", 8" and 12" substrates : -

  • Spin Coater Drying
  • Rinse / Cleaning / Spin Etching
  • Manual & Automatic coating
  • Spin Coater Developing
  • Chemical Compatibility
  • Hot Plate
  • Spin Coater with MegPie