DOPANTS for Diffusion Sources
DOPANTS for Diffusion Sources
BoronPlus and PhosPlus are proven products routinely used in semiconductors production. Silicon reliability be converted to n-doping or p-doping by our superior control of the deposition process utilizing BoronPlus aand PhosPlus.
Our BoronPlus and PhosPlus planar diffusion sources offer a superior dopant system for safe, cost effective and reliable doping of silicon wafers. Combined with process quality yields their safe processing and non-hazards nature many foundries have converted to using these sources.
Applications:
Analog
Bipolar
GBT
Micromachine
Opto-electronics
ASIC
CMOS
Power Transistor
Mixed Signals
MEMS
MOSFET