Broad beam ion and plasma products used in vacuum based process tools which interact with material at atomic level. Typical material processes include the precision deposition of thin films; remote plasma etching of the patterned wafer and nanometer–scale modification of the surfaces

• Applications under vacuum processes:

– Ion beam assisted deposition in thermal & e-beam evaporation (IBAD)

• Ion beam assisted deposition in magnetron sputtering (IBAD)

– In-situ preclean in sputtering & evaporation (PC)

– Surface modification and activation (SM)

– Direct deposition of thin hard or functional coatings (DD)

– Low energy ion beam etching (LIBE)

– Biased target ion beam sputter deposition (BTIBSD)